LioniX International offers a full range of photolithography services, fundamental to MEMS production processes. Our MEMS lithography technology includes:

  • Proximity and contact lithography.
  • Stepper process for high lithography resolution
  • e-beam lithography for very small feature size and high resolution

We apply these technologies to support key capabilities including:

  • Transfer of photoresist (positive and negative)
  • Transfer of thick photoresist for DRIE
  • Lift-off process for use with deposition steps
  • Application of polyimide inert protective layer

We are also equipped to heat-treat (post-bake) lithographically coated surfaces using furnaces and hotplates.